http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8551575-B1
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c28418cd4da32e733f63f42fab95d1e2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0733d72d6f47d7827347aa3aa1a988f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3236dae7bde348d545119ce163c5aa44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7a3195d2f30a475651b19b99bb8605de |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1689 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-54 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16 |
filingDate | 2012-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2013-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b93fa3352ed6049c065568eedd46e1b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e27d83eb333180cd15c381e7cca38e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c31e4b002384250a49ccb50c3791726 |
publicationDate | 2013-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-8551575-B1 |
titleOfInvention | Methods and solutions for preventing the formation of metal particulate defect matter upon a substrate after a plating process |
abstract | Methods and solutions for preventing the formation of metal particulate defect matter upon a substrate after plating processes are provided. In particular, solutions are provided which are free of oxidizing agents and include a non-metal pH adjusting agent in sufficient concentration such that the solution has a pH between approximately 7.5 and approximately 12.0. In some cases, a solution may include a chelating agent. In addition or alternatively, a solution may include at least two different types of complexing agents each offering a single point of attachment for binding metal ions via respectively different functional groups. In any case, at least one of the complexing agents or the chelating agent includes a non-amine or non-imine functional group. An embodiment of a method for processing a substrate includes plating a metal layer upon the substrate and subsequently exposing the substrate to a solution comprising the aforementioned make-up. |
priorityDate | 2008-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 72.