| abstract |
A metal film composed of multiple atomic layers continuously formed by atomic layer deposition of Ru and Ta or Ti includes at least a top section and a bottom section, wherein an atomic composition of Ru, Ta or Ti, and N varies in a thickness direction of the metal film. The atomic composition of Ru, Ta or Ti, and N in the top section is represented as Ru (x1) Ta/Ti (y1 )N (z1) wherein an atomic ratio of Ru (x1) /(Ta/Ti (y1) ) is no less than 15, and z1 is 0.05 or less. The atomic composition of Ru, Ta or Ti, and N in the bottom section is represented as Ru (x2) Ta/Ti (y2) N (z2) wherein an atomic ratio of Ru (x2) /(Ta/Ti (y2) ) is more than zero but less than 15, and z2 is 0.10 or greater. |