Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0537 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-097 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41F17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M3-006 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-32 |
filingDate |
2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2011-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3909725fcccef5f6afd4b6580cbf0533 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ba3cd2ce91035a039e6eae5a883a02d |
publicationDate |
2011-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7875313-B2 |
titleOfInvention |
Method to form a pattern of functional material on a substrate using a mask material |
abstract |
The invention provides a method to form a pattern of functional material on a substrate for use in electronic devices and components. The method uses a stamp having a relief structure to transfer a mask material to a substrate and form a pattern of open area on the substrate. The functional material is applied to the substrate in at least the open area. Contact of an adhesive material to an exterior surface opposite the substrate and separation of the adhesive from the substrate forms the pattern of functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012312464-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8058080-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013111994-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11062936-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8454787-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8334217-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009305513-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010197044-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017173852-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10899067-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9069244-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9097600-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9914293-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10748793-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11318663-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11472171-B2 |
priorityDate |
2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |