| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133512
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-201 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
| filingDate |
2003-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_243421df026eca446b58b42b9e34d070
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bf252cb678d0e3e92233f0ee47d0610
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c882a8d10321681c65c22225115d85ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_393e0577d67d1d4e2f0c50a6d7c35adc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_843d50d1c80e20709e5d67dab0e3d927
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9813bc4640fc7b70540698df1971e98c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7da56ce21321f7e8862de2db0a481e94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d313b21bc8a0c0149f2d6dcd73e6034f |
| publicationDate |
2008-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7354520-B2 |
| titleOfInvention |
Method of manufacturing optical element |
| abstract |
An optical element comprising at least a plurality of pixels formed on a substrate and partition walls arranged respectively between adjacent pixels is manufactured by a method comprising steps of forming partition walls of a resin composition on a substrate, performing a dry etching process by irradiating the substrate carrying the partition walls formed thereon with plasma in an atmosphere containing gas selected from oxygen, argon and helium, performing a plasma treatment process by irradiating the substrate subjected to the dry etching process with plasma in an atmosphere containing at least fluorine atoms, and forming pixels by applying ink to the areas surrounded partition walls by means of an ink-jet system. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8334012-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007172979-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011019134-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006134316-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8879029-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9029857-B2 |
| priorityDate |
2000-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |