| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76856
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76883
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-44 |
| filingDate |
2004-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef303b0a2a9933e11fac677c30611a82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_235b0f49062db86997ae92fe97a4daff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39af4502083f36ad35d9c6307f567b4f |
| publicationDate |
2007-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7279417-B1 |
| titleOfInvention |
Use of metallocenes to inhibit copper oxidation during semiconductor processing |
| abstract |
Methods for protecting an exposed copper surface of a partially fabricated IC from oxidation during exposure to an oxygen-containing environment are disclosed. The methods involve treating the exposed copper surface with a metallocene compound in order to minimize formation of copper oxide on the exposed surface, and exposing the copper surface to an oxygen-containing environment. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10731250-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7456101-B1 |
| priorityDate |
2004-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |