Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45529 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76841 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0272 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-4763 |
filingDate |
2007-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2008-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1f700455a1ef093c83326c4079b8695 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39af4502083f36ad35d9c6307f567b4f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef303b0a2a9933e11fac677c30611a82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_235b0f49062db86997ae92fe97a4daff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83b7d106535cdf694dc2afb2abbdb3cd |
publicationDate |
2008-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7456101-B1 |
titleOfInvention |
Method for enhancing the nucleation and morphology of ruthenium films on dielectric substrates using amine containing compounds |
abstract |
Methods for depositing a ruthenium metal layer on a dielectric substrate are provided. The methods involve, for instance, exposing the dielectric substrate to an amine-containing compound, followed by exposing the substrate to a ruthenium precursor and an optional co-reactant such that the amine-containing compound facilitates the nucleation on the dielectric surface. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10731250-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109594100-A |
priorityDate |
2004-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |