| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f50f95c17e4934fb9f9810574cdf87aa |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate |
2001-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_847a69a4221cc4a6562b48059b4e74fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_251172db446357f3de0213c57ddf4752 |
| publicationDate |
2005-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6905981-B1 |
| titleOfInvention |
Low-k dielectric materials and processes |
| abstract |
Improved dielectric materials suitable for use in integrated circuits and computer systems are provided by a chemical vapor deposition process employing fluoroalkane precursors. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8092861-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006247404-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008160215-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7425350-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010032829-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8293634-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009061201-A1 |
| priorityDate |
2000-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |