| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f50f95c17e4934fb9f9810574cdf87aa |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-12044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-296
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-29 |
| filingDate |
2002-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f93df0b69fca026b89c6773511cf680
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbcd9a1628ce0566ff5be56603392921
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c8be73fa85566fbe5602d8e9a8cc69e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02c18b8a1dc8e766a77fab739ee0c546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55fb12f266133a1d81bc8ff966564662
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc3e645f36c833cde4582cbb765e171b |
| publicationDate |
2005-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6852650-B2 |
| titleOfInvention |
Insulation film on semiconductor substrate and method for forming same |
| abstract |
An insulation film is formed on a semiconductor substrate by vaporizing a silicon-containing hydrocarbon compound to provide a source gas, introducing a reaction gas composed of the source gas and an additive gas such as an inert gas and oxidizing gas to a reaction space of a plasma CVD apparatus. The residence time of the reaction gas in the reaction space is lengthened by reducing the total flow of the reaction gas in such a way as to form a siloxan polymer film with a low dielectric constant. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007027532-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005261763-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006110931-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010261925-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005153572-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005240100-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7153787-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005244337-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010174103-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005278020-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005153073-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007275569-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7256139-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8637412-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005130404-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7422774-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004234688-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011042789-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7582575-B2 |
| priorityDate |
1998-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |