| abstract |
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and are developable to form resist structures of high resolution and high etch resistance are enabled by the use of a combination of (a) an imaging polymer comprising a monomer selected from the group consisting of a cyclic olefin, an acrylate and a methacrylate, (b) a radiation-sensitive acid generator, and (c) a lactone additive. The lactone additive preferably contains at least 10 carbon atoms and more preferably at least one saturated alicyclic moiety. The imaging polymer is preferably a cyclic olefin polymer. |