| abstract |
(57) Abstract: A radiation-sensitive material and a pattern forming method using the radiation-sensitive material, the radiation-sensitive material and the pattern formation capable of improving a difference in a dissolution rate in a developing solution between an exposed part and an unexposed part. Provide a way. SOLUTION: A base resin composed of a film-forming polymer, a photosensitive agent, and a compound represented by the general formula: (Wherein, R 1 represents an atomic group having 2 to 30 carbon atoms; R 2 represents hydrogen, a hydroxyl group, an alkyl group having 1 to 10 carbon atoms, Represents a hydroxyalkyl group of 10 or a haloalkyl group having 1 to 10 carbon atoms; n represents an integer of 2 to 8; Represents an integer of 6. ) And a solvent that dissolves the base resin, the photosensitive agent and the lactone derivative compound. |