| abstract |
(57) [Summary] (Correction) [PROBLEMS] To provide a resist composition capable of forming a fine resist pattern without swelling with a sensitivity that is practical. SOLUTION: In the chemically amplified resist composition, The acid-sensitive polymer contained in it together with the photo-acid generator is A lactone moiety represented by the following formula (I): (In the above formula, R represents a linear or branched alkyl group having 1 to 4 carbon atoms, which may be substituted or unsubstituted, and n is an integer of 1 to 4. ) As a carboxyl-protecting group. |