| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2000-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbedb1a5039de4a4d2212c916ad759ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d7553b249b3632974346bc3d101edca |
| publicationDate |
2001-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6225476-B1 |
| titleOfInvention |
Positive-working photoresist composition |
| abstract |
Provided by the invention is a chemical-amplification positive-working photoresist composition used in the fine photolithographic patterning in the manufacturing process of semiconductor devices, which is suitable for the patterning light exposure with ArF excimer laser beams of very short wavelength by virtue of absence of aromatic structure in the ingredients of the composition. The composition comprises, as the film-forming resinous ingredient, an acrylic resin having unique monomeric units represented by the general formulain which R1 is a hydrogen atom or a methyl group, R2 and R3 are each, independently from the other, an alkyl group having 1 to 4 carbon atoms and R4 is an alkoxycarbonyl group or a group derived from a molecule of a lactone compound or ketone compound by removing a hydrogen atom bonded to the carbon atom. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6503687-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7488565-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006057496-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006063107-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7304190-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005074690-A1 |
| priorityDate |
1997-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |