| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C5-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C41-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J123-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2000-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7300239c895e7e7fd4505690033de34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dcaf2e41aae10e9b79738c410a8afc8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78ebd41b7d878a0149ab3fb979a92d41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2c1a01fd537284b8f65a59c45498586
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a29acea57d89d336e5ab2522d59a99e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cbb60c8c426b2282ffb05ac6d62c572
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd88cce7193f9976ede48b396403b8aa |
| publicationDate |
2001-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6251560-B1 |
| titleOfInvention |
Photoresist compositions with cyclic olefin polymers having lactone moiety |
| abstract |
Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation (and possibly other radiation) and are developable to form photoresist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing cyclic olefin polymer having a cyclic olefin monomer having a lactone moiety, the monomer having no oxygen atoms intervening between the lactone moiety and a ring of the cyclic olefin. Preferred lactone moieties are spirolactones (having a 5 or 6 membered ring) directly to a cyclic olefin ring. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6503687-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6677419-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6756180-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7118847-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6627391-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6808859-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004131968-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010305308-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002132185-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6936398-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6753124-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003211734-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111123643-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6794109-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6764811-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6866984-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6599677-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005170278-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6924079-B2 |
| priorityDate |
2000-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |