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publicationDate 2001-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6168900-B1
titleOfInvention Chemically amplified resist
abstract To provide chemically amplified resist which is excellent in resolution, focusing and size accuracy as well by preventing problem of T-shaped resist pattern and reinforcing exposure dependence of solution speed, a mixture of t-BOC protected polyhydroxystyrene polymers having different molecular weight are used as a basic polymer of chemically amplified resist together with PAG. Preferable molecular-weight ratio and mixing ratio of the mixture are 1:5 to 1:20, and 10 to 30 parts by weight of low molecular-weight polymer to 100 parts of high molecular-weight polymer, respectively.
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