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publicationDate 2000-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6071830-A
titleOfInvention Method of forming insulating film
abstract An object of the Invention is to provide a method of forming an insulating film capable of stably causing the insulating film (an organic insulating film) made of an organic material to stably adhere to the surface of a silicon oxide film for a long time without generation of any void The surface of the silicon oxide film is hydroxylated prior to forming the organic insulating film on the silicon oxide film, and the surface of the silicon oxide film is coated with a silane coupling agent. In a case where fluororesin is employed to form the organic insulating film, a compound containing a fluorine atom is preferably employed as the silane coupling agent.
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