abstract |
The present invention relates to a silicon-containing thin film deposition composition comprising a bis(aminosilyl)alkylamine compound and a method for manufacturing a silicon-containing thin film using the same, and more specifically, bis(amino) that can be usefully used as a precursor for a silicon-containing thin film. It relates to a composition for depositing a thin film containing silicon containing a silyl) alkylamine compound and a method for manufacturing a thin film containing silicon using the same. |