| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-004 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32431 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
1996-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_720704e4f86e8faa89ccd1767db13ec2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d677933c452c28d5d4d7f1a86f409b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cf5646fcb80ea7612372112bc87273c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84f40b7ed62dd023d0fd9a40ada72e05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2caee538046140202cf72e54b83d5589 |
| publicationDate |
1999-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5904571-A |
| titleOfInvention |
Methods and apparatus for reducing charging during plasma processing |
| abstract |
An apparatus and method in a plasma processing chamber for reducing charging of a wafer is described. A plasma generating element is configured to cause a plasma including ions and free radicals to be formed in a plasma generating region. A plasma diffusion region is configured so that plasma generated in the plasma generating region can diffuse through the plasma diffusion region. A conductive grid is positioned within the plasma diffusion region between the wafer and the plasma generating region. The conductive grid includes a mesh which is configured to trap a portion of the ions so that a portion of the ions are prevented from diffusing through the diffusion region to reach the wafer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007148928-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003136516-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003205327-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8801896-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004042798-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004042798-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03096765-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7604708-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100447935-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7611640-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03096765-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009277874-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7086347-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101276694-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010270262-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013118687-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007204957-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004219789-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101352995-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7156950-B2 |
| priorityDate |
1996-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |