| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_26be7eb4a716352828dac6f8bd7317eb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
1997-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90188b949be9d0e145d6660e556e9c48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6741f83c045229a8733d64ddccf98cdb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3688bf03cad9c4608bb12b5fcfd3ea1d |
| publicationDate |
1999-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5893757-A |
| titleOfInvention |
Tapered profile etching method |
| abstract |
A method of etching an article having a substrate, an etchable film and a mask layer having a pattern formed therein includes the step of exposing the article to an etchant gas mixture which includes a halogen-containing gas and an inert gas. An etching profile is formed which is substantially smooth across an interface between the etchable film and the mask layer. The method is particularly useful in producing components of articles such as flat-panel displays. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9748341-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6258729-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6924199-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100562494-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006166508-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7655514-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9024328-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6942816-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6165845-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11121034-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6635922-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008096335-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009239033-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004073025-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004073025-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100346604-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010019756-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8202439-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6531728-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6620715-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005112828-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004155012-A1 |
| priorityDate |
1997-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |