| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3a2f00e72ba6e4c09b6da573427fbed |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-90 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76897
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2001-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ceef2aba0d2705e049dc944027f1be76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d3c1f16b0050389d11b3523604f8f24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc8a7fa31faaca84d1b46fc4befa4899 |
| publicationDate |
2003-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6531728-B2 |
| titleOfInvention |
Oxide etching method and structures resulting from same |
| abstract |
An etching method includes providing a first insulating material layer on a substrate assembly surface and a second insulating material layer on the first insulating material layer. The first insulating material layer has an etch rate that is greater than the etch rate of the second insulating material layer when exposed to an etch composition. Portions of the first insulating material layer and the second insulating material layer are removed using at least the etch composition. Various types of structures (e.g., contacts, capacitors) are formed with use of the method. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10580783-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007099406-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004121548-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7537987-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7368372-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005009280-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005009279-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006166445-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6927135-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7067378-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7060569-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7060570-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7375027-B2 |
| priorityDate |
1999-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |