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publicationDate 1998-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5733706-A
titleOfInvention Dry-developable positive resist
abstract A dry-developable, positively acting TSI resist contains the following components: n a suitable solvent, n a strong acid former as the photoactive component, and n a base polymer in the form of a copolymer or terpolymer with maleic acid anhydride as a basic unit and glycidyl methacrylate and/or a styrene derivative as a further basic unit, and possibly an additive.
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