| abstract |
A non-aqueous biodegradable negative photoresist stripping composition having low toxicity and is operable at temperatures at 85 DEG C. or less which comprises about 85% by weight of an aromatic hydrocarbon solvent of the formula selected from the group consisting of: <IMAGE> I <IMAGE> II and <IMAGE> III wherein R1 and R2 are the same or different and each is a member selected from the group consisting of methyl, ethyl n-propyl and isopropyl, and an organic sulfonic acid of the formula: R3-SO3 H wherein R3 is a member selected from the group consisting of phenyl, tolyl, dodecylbenzene and naphthyl, the ratio of the aromatic solvent to organic solvent acid being about 60 to 96% by weight to about 4 to 40% by weight. |