| abstract |
An electrodepositable photosensitive modified phenolic novolak resin of general formula ##STR1## where Ar 1 represents a divalent aromatic group linked through aromatic carbon atoms to the indicated groups --OR 2 and --CH(R 1 )--, n Ar 2 represents a trivalent aromatic group linked through aromatic carbon atoms to the indicated groups --OR 2 and --CH(R 1 )--, n R 1 represents a hydrogen atom or an alkyl, aryl or carboxyl group, n R 2 represents a hydrogen atom, an alkyl group which may be substituted by a hydroxyl or alkoxy group, or a group of formula --CO--R 3 --COOH, --SO 2 R 4 , --COR 5 or --SO 2 R 5 , at least 1% of the groups R 2 representing a group --CO--R 3 --COOH and at least 4% of the groups R 2 representing a group --SO 2 R 4 , n R 3 denotes a divalent aliphatic, cycloaliphatic, aromatic or araliphatic group, n R 4 denotes a 1,2-benzoquinone diazide group or 1,2-naphthoquinone diazide group n R 5 denotes a carboxyl-free monovalent group, and n n denotes zero or an integer of 1 to 20. n The resins are useful in printed circuit manufacture. |