| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32132
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 |
| filingDate |
1977-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1978-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b41102e053d5f76e872845dfdb004241 |
| publicationDate |
1978-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4094732-A |
| titleOfInvention |
Silicon etching process |
| abstract |
In the manufacture of semiconductor devices it is often times necessary to use photomasks. It has been found that silicon material is useful as see-through photomasks when deposited on a thin film of glass. After deposition the silicon is etched to form the mask. A suitable etchant, which may be used and which does not undercut patterned material formed over the silicon, may be derived from a composition of CCl4 + N2 + Cl2 and in some instances + HCl. This etchant may also be used in patterning polysilicon leads on various silicon devices such as charged coupled devices without undercutting of the leads. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4229233-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4361461-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4492610-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5770098-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4364793-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100472175-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4582581-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0015403-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4267012-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4353777-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0036144-A1 |
| priorityDate |
1975-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |