http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3930913-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d4761369485699b9ca27e2cb1fbe8aec
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-293
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-485
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-485
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-29
filingDate 1974-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1976-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37a628b698fa0559844db57eb0404434
publicationDate 1976-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-3930913-A
titleOfInvention Process for manufacturing integrated circuits and metallic mesh screens
abstract A process step for use in the manufacture of thin film integrated circuits, hybrid circuits and fine metallic mesh screens, to enable the removal of all organics and photoresist material from underlying metallic films without concomitant degradation of the metallic surface. After etching of preselected portions of an underlying critical metallic surface, the material is exposed to a low pressure (few torr) rf generated "cold" plasma, where the plasma is a homogeneous gaseous mixture of oxygen and nitrogen.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4172004-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007155161-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6030901-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4243865-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3975252-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4343677-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4012307-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-8002353-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4222337-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6705003-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4787957-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0123813-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0123813-A3
priorityDate 1974-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3795557-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3816196-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3615956-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3664899-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-3846166-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23985
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458391465
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412550040
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23976
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418354341
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523825
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID935
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23978
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID482532689
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID517277
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977

Total number of triples: 51.