| abstract |
A method of producing optical masks by coating one surface of a transparent plate with a photoresist layer containing, as an additive, a catalyst for subsequent electroless deposition. The photoresist layer is exposed to a light pattern which activates the conventional sensitizer contained in the photoresist layer to harden the photoresist in the exposed areas. The photoresist is then treated with a developer which removes the unexposed, unhardened areas, leaving a pattern corresponding to the light pattern of photoresist containing a catalyst for electroless deposition. The substrate is then treated with a conventional electroless deposition bath which selectively deposits the metal in the areas coated with the photoresist pattern. |