| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2051317369a779747701bc0ebe411a4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0716
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49746
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0793
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1415
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-225 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-184
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1889
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1608
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1612 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 |
| filingDate |
1976-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1978-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef462ff7b6339ffca7672471a0e61ac1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d32fb09d3d67353b4100e490d2a45fd2 |
| publicationDate |
1978-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4107351-A |
| titleOfInvention |
Method of depositing or repairing a patterned metal layer on a substrate |
| abstract |
In a wholly additive process for depositing a patterned metal layer on an insulating substrate, the sensitized and activated substrate is coated with photoresist; a desired pattern is formed in the photoresist layer by exposing it to a mask and developing it using conventional techniques; the patterned surface is then contacted with a second developer solution containing the activator; a metal pattern is deposited by electroless metal plating; and the photoresist is removed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5190637-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4200668-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4388351-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5919514-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5189777-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5496668-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5206983-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4902610-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9513551-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4317559-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5357807-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5334487-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4623608-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0144612-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0144612-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5268259-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5327033-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5576147-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5378583-A |
| priorityDate |
1976-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |