Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c0444efde206a2f829562761e58b7e1e |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate |
2019-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6df1bba8c3ec08db7ae0c1fbad9daaec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8f717238023bed3e40fe992bb7f3314 |
publicationDate |
2021-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2021040253-A1 |
titleOfInvention |
Photoresist resin, production method for photoresist resin, photoresist resin composition, and pattern formation method |
abstract |
Provided are a photoresist resin having high solubility in solvents and a method for producing the photoresist resin. Also provided are a photoresist resin composition containing the photoresist resin and a pattern formation method using the photoresist resin composition. A photoresist resin containing no cyano group at a resin end and having a molecular weight distribution (Mw/Mn) of not greater than 1.4. |
priorityDate |
2018-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |