| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e0bf0928b608797b70bbc2b91c7e52e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-04 |
| filingDate |
2015-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c731dc1d3fb9618e5c80a21cdf73611
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bed44f3200d85d6575f9d08518aa3599
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5ad8cccd5c57dcd6928fd2f98e6e9bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bc307fb60236904b732d210fba663dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88e44ad8fa6c8d11c6b2a7c7b658b8df
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00637f4cbedc142ca6b8e4795d8b360f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7b00f2a0853b2be512f3fede3430d16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17fdd1fe67be62d7acc0db72020fddb7 |
| publicationDate |
2017-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2017158913-A1 |
| titleOfInvention |
Chemical mechanical polishing (cmp) composition |
| abstract |
A chemical mechanical polishing (CMP) composition (Q) comprising (A) Colloidal or fumed inorganic particles (A) or a mixture thereof in a total amount of from 0.0001 to 2.5 wt.-% based on the total weight of the respective CMP composition (B) at least one amino acid in a total amount of from 0.2 to 1 wt.-% based on the total weight of the respective CMP composition (C) at least one corrosion inhibitor in a total amount of from 0.001 to 0.02 wt.-% based on the total weight of the respective CMP composition (D) hydrogen peroxide as oxidizing agent in a total amount of from 0.0001 to 2 wt.-% based on the total amount of the respective CMP composition (E) aqueous medium wherein the CMP composition (Q) has a pH in the range of from 6 to 9.5. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11001733-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11688607-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115678439-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11718768-B2 |
| priorityDate |
2014-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |