http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11001733-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 |
| filingDate | 2019-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e65759a794f26829715254c0c6b6989b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99ccbdd341a79fa5e8a4d73f7a0516c3 |
| publicationDate | 2021-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-11001733-B2 |
| titleOfInvention | Compositions for polishing cobalt and low-K material surfaces |
| abstract | Provided herein are compositions and methods for polishing surfaces comprising cobalt and optionally a low-K material, e.g., in semiconductor device fabrication. Embodiments include a slurry for chemical mechanical polishing a surface comprising cobalt and low-K materials, such as Black Diamond (BD) or SiN, comprising a complexor, an oxidizer, an abrasive, a Co corrosion inhibitor and an ILD suppressor. |
| priorityDate | 2019-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 447.