| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F11-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F11-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 |
| filingDate |
2018-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_501bb994cd7121f96e4a2a952ba7d09c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e65759a794f26829715254c0c6b6989b |
| publicationDate |
2019-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2019292405-A1 |
| titleOfInvention |
Slurries for chemical mechanical polishing of cobalt containing substrates |
| abstract |
Provided herein are methods and compositions for chemical mechanical polishing (CMP) of a cobalt containing substrate. The present methods and compositions involve the use of a complexor, an oxidizer, an abrasive and a cobalt corrosion inhibitor including an amino acid having at least two acidic moieties. The present methods and compositions can be used to achieve a high cobalt removal rate, while effectively inhibiting corrosion during CMP. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11001733-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/LU-101645-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114892176-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114350264-A |
| priorityDate |
2018-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |