http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017125251-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdd90352500b7c2010a1d6540d20d10f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36d0e39457626b9856c6bc3c4e503ba2 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0528 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2855 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-10 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 |
| filingDate | 2015-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a800d67a3746d390a1b8a85f197f02a3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84b1c44951bcd0a45d36aac8a0681461 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8803c6be7fca965b03178bc88620cc0d |
| publicationDate | 2017-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2017125251-A1 |
| titleOfInvention | Method for manufacturing selective surface deposition using a pulsed radiation treatment |
| abstract | The present invention relates to a method of manufacturing a direct and selective surface deposition by a pulsed radiation treatment. Said method allows the production of a selective pattern on any receiving material without any pre-treatment and/or post-treatment of said receiving material. The invention provides a selective deposition of a monolayer donor material onto a receiving material by means of a pulsed radiation treatment without any contact between said donor and receiving materials. It further provides a method of direct surface metallization of various types of receiving materials using a pulsed radiation treatment. The present invention provides a method of manufacturing a direct and selective surface deposition by a pulsed radiation treatment of a monolayer donor material onto a receiving material. The present invention relates more particularly to a method of manufacturing free form patterned deposition on surfaces of various receiving materials. |
| priorityDate | 2014-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 93.