| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdd90352500b7c2010a1d6540d20d10f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cab889f84547135d578122c4a7fab465 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0528 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2855 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-04 |
| filingDate |
2014-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_410ee3993d1729fadf9e1cfe0580bf7c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e96ae4acb229f4a9a6f061f84bf37c20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ccc2adb850453cb8b85ea4c28748c81 |
| publicationDate |
2015-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-2955981-A1 |
| titleOfInvention |
Method for manufacturing selective surface deposition using a pulsed radiation treatment |
| abstract |
The present invention relates to a method of manufacturing a direct and selective surface deposition by a pulsed radiation treatment. Said method allows the production of a selective pattern on any receiving material without any pre-treatment and/or post-treatment of said receiving material. The invention provides a selective deposition of a donor material onto a receiving material by means of a pulsed radiation treatment without any contact between said donor and receiving materials. It further provides a method of direct surface metallization of various types of receiving materials using a pulsed radiation treatment. The present invention provides a method of manufacturing a direct and selective surface deposition by a pulsed radiation treatment of a donor material onto a receiving material. The present invention relates more particularly to a method of manufacturing free form patterned deposition on surfaces of various receiving materials. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3543371-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017125251-A1 |
| priorityDate |
2014-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |