| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7885c0b87178d8ba04eed3f23b31f33a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdd90352500b7c2010a1d6540d20d10f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0528
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-107 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2855
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 |
| filingDate |
2015-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd8017417f272c3934b827d3a619575d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a048887ffae71838deecaa4597fce4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6032a23d94c28824ef3e4ac773517c1f |
| publicationDate |
2015-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2015189432-A1 |
| titleOfInvention |
Method for manufacturing selective surface deposition using a pulsed radiation treatment |
| abstract |
The present invention relates to a method of manufacturing a direct and selective surface deposition by a pulsed radiation treatment. Said method allows the production of a selective pattern on any receiving material without any pre-treatment and/or post-treatment of said receiving material. The invention provides a selective deposition of a monolayer donor material onto a receiving material by means of a pulsed radiation treatment without any contact between said donor and receiving materials. It further provides a method of direct surface metallization of various types of receiving materials using a pulsed radiation treatment. The present invention provides a method of manufacturing a direct and selective surface deposition by a pulsed radiation treatment of a monolayer donor material onto a receiving material. The present invention relates more particularly to a method of manufacturing free form patterned deposition on surfaces of various receiving materials. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102019212656-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017125251-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-3096929-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020245083-A1 |
| priorityDate |
2014-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |