| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2021-60187
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2016-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e87cf0304eba3bffb436883132f7fa03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2dd2cbeb250542d6db0503886b43c6c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e9db9dfcf154b39f17cff2b214491b4 |
| publicationDate |
2017-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2017062227-A1 |
| titleOfInvention |
Seasoning method and etching method |
| abstract |
A time required to return an inside of the chamber after performing maintenance of the inside of the chamber into a state prior to the maintenance can be shortened. A seasoning method includes a first dry cleaning process of cleaning the inside of the chamber by supplying an O 2 gas into the chamber and generating plasma of the O 2 gas within the chamber; and a second dry cleaning process of seasoning, after the first dry cleaning process, the inside of the chamber by supplying a processing gas containing fluorine into the chamber and generating plasma of the processing gas within the chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019279850-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10867777-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11359279-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10410841-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111172515-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11139150-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11666950-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020290095-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10008368-B2 |
| priorityDate |
2015-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |