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filingDate 2019-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2019-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2019279850-A1
titleOfInvention Plasma processing method and plasma processing apparatus
abstract A plasma processing method includes: plasma-processing a substrate placed on a surface of a placement table while causing a coolant of 0° C. or lower to flow through a coolant flow path formed inside the table; placing a dummy substrate on the surface of the placement table in place of the substrate; and removing a reaction product generated due to the plasma processing of the substrate by the plasma of the processing gas from a peripheral edge portion of the surface of the placement table while heating the surface of placement table by the plasma of the processing gas via the dummy substrate in a state where the dummy substrate is placed on the surface of the placement table.
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