| abstract |
Provided are a sealing sheet capable of suppressing generation of voids due to satisfactory embeddability in irregularities of a semiconductor element or an adherend and with satisfactory workability before and after the sealing sheet is bonded to the adherend; a method for producing a semiconductor device using the sealing sheet; and a substrate with the sealing sheet bonded thereto. The sealing sheet includes a base material, and an under-fill material provided thereon having the following characteristics: a 90° peel strength from the base material of 1 mN/20 mm or more and 50 mN/20 mm or less; a rupture elongation of 10% or more at 25° C.; a minimum viscosity of 20,000 Pa·s or less at a temperature of 40° C. or more and 100° C. or less; and a minimum viscosity of 100 Pa·s or more at a temperature of 100° C. or more and 200° C. or less. |