abstract |
Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. n n n n n n n n n n In the above Chemical Formula 1, n A 1 to A 3 , X 1 to X 3 , L 1 , L 2 , n and m are the same as described in the detailed description. |