| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32642
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32559
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2013-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d476e10970bd3913e52f206ca20a9d7e |
| publicationDate |
2015-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015206722-A1 |
| titleOfInvention |
Lower electrode and plasma processing apparatus |
| abstract |
A lower electrode 2 includes a conductive base member 2 a to which a high frequency power is applied; an electrostatic chuck 6 , having an insulating layer 6 b formed on a top surface of the base member 2 a to cover an electrode 6 a , configured to electrostatically attract a semiconductor wafer W as a target of a plasma process onto the insulating layer 6 b ; a focus ring 5 provided on a top surface of the insulating layer 6 b of the electrostatic chuck 6 to surround the semiconductor wafer W; and a thermally sprayed film 100 , which is conductive and formed on a portion of the insulating layer 6 b of the electrostatic chuck 6 positioned between the focus ring 5 and the base member 2 a by using a composite material in which titania is added to an insulating material for the insulating layer at a preset weight ratio. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10847348-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11024532-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10497597-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020176226-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10083853-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11776795-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019006225-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017110356-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108475633-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11282734-B2 |
| priorityDate |
2012-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |