| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-0318 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32486
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2013-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a02db22c3089c77bc2ed95a15d0bed8 |
| publicationDate |
2014-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014357092-A1 |
| titleOfInvention |
Chamber wall of a plasma processing apparatus including a flowing protective liquid layer |
| abstract |
A semiconductor plasma processing apparatus includes a vacuum chamber in which semiconductor substrates are processed, a process gas source in fluid communication with the vacuum chamber for supplying a process gas into the vacuum chamber, and an RF energy source adapted to energize the process gas into the plasma state in the vacuum chamber. The apparatus can also include a chamber wall wherein the chamber wall includes a means for supplying a plasma compatible liquid to a plasma exposed surface thereof wherein the plasma compatible liquid flows over the plasma exposed surface thereby forming a flowing protective liquid layer thereon. A liquid supply delivers the plasma compatible liquid to the chamber wall. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016240726-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022403509-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107154333-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10618026-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10808097-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11591477-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10138378-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11149148-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016126600-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016086773-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11453784-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10100200-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018315629-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10370539-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016362782-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11492496-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11304288-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11760884-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11203692-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11665808-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107709608-A |
| priorityDate |
2013-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |