| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-905
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S134-902 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
2007-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05b787e944e630140e2464d5eb24ef04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80783711d0193bfd1ebad13485fe9810
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a02db22c3089c77bc2ed95a15d0bed8 |
| publicationDate |
2010-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7767584-B1 |
| titleOfInvention |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control |
| abstract |
A method for providing substantially similar chamber condition before each wafer process operation in a semiconductor process chamber is provided. The method allows for prevention of transport of particle and metal contamination from chamber surfaces to the processed wafer. The method initiates with depositing a silicon containing layer over an inner surface of an empty semiconductor process chamber. Then, a wafer is introduced into the semiconductor process chamber after depositing the silicon containing layer. Next, a process operation is performed on the wafer. The process operation deposits a residue on the silicon containing layer. Next, an in-situ cleaning process is initiated upon completion of the processing operation and removal of the wafer. The process initiation includes flowing a fluorine containing gas into the semiconductor process chamber, and establishing a pressure within the semiconductor process chamber capable of allowing a plasma created from the fluorine containing gas to clear the silicon containing layer covering the inner surface of the processing chamber. A semiconductor processing chamber having a silicon containing pre-coat is also provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109904054-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018075254-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I704595-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8231732-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9745658-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200067776-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111868890-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021265136-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10211099-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11365479-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190030587-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020273683-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10184173-B1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009205676-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10760158-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9828672-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190031101-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018191704-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019053836-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10023956-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021188340-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014357092-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10497544-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9548188-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10886106-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210104638-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I501340-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9997364-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11761079-B2 |
| priorityDate |
2002-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |