| abstract |
There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist patternn the compound represented by general formula (1-1): wherein each of R 1 and R 3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R 2 and R 4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R 2 and R 4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y 1 represents a single bond or —SO 2 —; R 5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M + represents an organic cation or a metal cation, |