| abstract |
The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): n n n n n n n n n n wherein R 1 represents a C2-C12 alkyl group which can have one or more hydroxyl groups, etc.,n R 2 and R 3 each independently represent a hydrogen atom, etc., R 4 , R 5 and R 6 each independently represent a hydrogen atom, etc., A 1 represents a single bond or a C1-C2 alkylene group in which one or more βCH 2 β can be replaced by βOβ. |