abstract |
The present application relates to a compound of formula n n n n n n n n n n where X is selected from the group CF 3 SO 3 , C 4 F 9 SO 3 , N(SO 2 C 2 F 5 ) 2 , N(SO 2 CF 3 SO 2 C 4 F 9 ), N(SO 2 C 3 F 7 ) 2 , N(SO 2 C 4 F 9 ) 2 , CF 3 CHFO(CF 2 ) 2 SO 3 , and CH 3 CH 2 CH 2 O(CF 2 ) 4 SO 3 . A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for. |