| abstract |
A method for forming carbon-doped epitaxial SiGe of a PMOS transistor by providing a semiconductor substrate having a PMOS transistor gate stack and recess etched active regions. The method includes forming carbon-doped epitaxial SiGe within the recess etched active regions. A PMOS transistor includes a semiconductor substrate, a PMOS transistor gate stack, and source/drain extensions. The PMOS transistor also includes carbon-doped epitaxial SiGe source/drain regions. |