| abstract |
It is a main object of the present invention to provide a polyimide precursor and a polyimide precursor resin composition, which precursor being easy to synthesize, available at low cost, excellent in storage and capable of giving polyimide that is low in impurities after imidization, irrespective of the chemical structure of the finally-obtained polyimide. n It is another object of the present invention to provide a polyimide precursor having repeating units represented by the following formula (1) and a photosensitive resin composition comprising the polyimide precursor and a photoacid generator or photobase generator: n n n n n n n n n n In the formula (1), R 1 is a tetravalent organic group; R 2 is a divalent organic group; R 1 s may be the same or different from each other and R 2 s may be the same or different from each other in the repeating units; R 3 and R 4 respectively represent a monovalent organic group having a structure represented by the following formula (2) and may be the same or different from each other; and R 3 s and R 4 s in the repeating units may be the same or different from each other, respectively. In the formula (2), R 5 , R 6 and R 7 respectively represent a hydrogen atom, a halogen atom or a monovalent organic group; R 8 is a monovalent organic group; R 8 s in the repeating units may be the same or different from each other; 35 mole % or less of R 8 s are organic groups having a reactive group; and R 5 , R 6 , R 7 and R 8 may be bonded to each other to form a ring structure. |