Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76808 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
filingDate |
2007-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a25b4af9044d01603161debde183f8d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb4b72a1b7e729a827bf6e0e46a8bfe4 |
publicationDate |
2008-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2008268641-A1 |
titleOfInvention |
Method for forming dual damascene pattern |
abstract |
A method for forming a dual damascene pattern includes preparing a multi-functional hard mask composition including a silicon resin as a base resin; forming a deposition. structure including a self-arrangement contact insulation film, a first dielectric film, an etching barrier film, and a second dielectric film over a hardwiring layer; etching the deposition structure to expose the hardwiring layer, thereby forming a via hole; forming the multi-functional hard mask composition on the second dielectric film and in the via hole to form a multi-functional hard mask film; and etching the resulting structure to expose a part of the first dielectric film, thereby forming a trench having a width wider than that of the via hole; and removing the multi-functional hard mask film. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011156258-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7994065-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7994050-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010311239-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009061639-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012219793-A1 |
priorityDate |
2006-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |