| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2008-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bcdb68bc595a439ae3e46cea8b313ad
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_648edee77b2d221e22ff51dc61d55720
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4f3b02d4961f22ef1496f42c238eb86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_111760d231ef3ccb47ac73cfb9e7c7fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db09b0f5e7cbc5b2bc0247ba5171a26a |
| publicationDate |
2008-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008179005-A1 |
| titleOfInvention |
Plasma processing apparatus and control method thereof |
| abstract |
There is provided a plasma processing apparatus includes a lower electrode in a processing chamber on which a object to be processed is mounted; an upper electrode confronting the lower electrode; a first and a second high-frequency power supply for applying high-frequency powers respectively to the upper and the lower electrode; and an output controller for raising each of outputs from the high-frequency power supplies at least three times in a stepwise manner up to each of set levels for processing the object to be processed. The output controller adjusts each of rising times of the outputs from the high-frequency power supplies so that an output of the second high-frequency power supply is raised earlier than an output of the first high-frequency power supply while the outputs from the high-frequency power supplies are raised up to the set levels in a stepwise manner. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I489117-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010163184-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010271040-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104360211-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102415221-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8186300-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8320099-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8466697-B2 |
| priorityDate |
2004-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |