| abstract |
An immersion exposure system 1 performs an exposure process through a liquid 301 provided between an optical element of a projection optical means 121 and a substrate 111 . The immersion exposure system 1 includes a liquid supply section 80 which supplies the liquid 301 , an exposure section to which the liquid 301 ( 301 b ) supplied from the liquid supply section 80 is continuously introduced along a specific direction and which performs an exposure process in a state in which a space between the optical element of the projection optical means 121 and the substrate 111 is filled with the liquid 301 , a liquid recovery section 90 which recovers the liquid 301 ( 301 a ) passed through the exposure section 110 at a symmetrical position against the substrate 111 , and a liquid recycling section 20 which recycles the liquid 301 ( 301 c ) recovered by the liquid recovery section 90 . The properties of the immersion exposure liquid can be stabilized when applying an immersion method, whereby exposure can be advantageously and continuously performed, and running cost can be reduced. |