| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3299
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d73fddeb26fc0eb13bbd594190fec5ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6044a2cc73f553239f523e6a3cf50541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a23d127d2b2da81b95a3a71fea9b95a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31d42e62a0c122bf9152f9dd56c17e33 |
| publicationDate |
2008-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008099450-A1 |
| titleOfInvention |
Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution |
| abstract |
A plasma reactor is provided having multiple frequency control of etch parameters. The reactor includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, and an inductively coupled source power applicator and a capacitively coupled plasma source power applicator. An array of optical fibers extends through the support surface of the workpiece support to view the workpiece through its bottom surface. Optical sensors are coupled to the output ends of the optical fibers. The reactor further includes a controller responsive to the optical sensors for adjusting the relative amounts of power simultaneously coupled to plasma in the chamber by the inductively coupled plasma source power applicator and the capacitively coupled plasma source power applicator. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019226293-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9859127-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009274590-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009137405-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9153453-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10170280-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009137405-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013160795-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11139150-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019252153-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11024528-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008102001-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10410841-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10784082-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012109572-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10930478-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9786471-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9218944-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9396911-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018308737-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10008368-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10157805-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11610759-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110494967-A |
| priorityDate |
2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |