http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007010175-A1

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filingDate 2005-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a77944237c165ba11f82052fbdedbe7
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publicationDate 2007-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2007010175-A1
titleOfInvention Polishing pad and method of producing same
abstract The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate; (b) impregnating the surface of the base material with an elastomer solution; (c) curing the elastomer impregnated in the surface of the base material to form a plurality of first continuous pores embedded in the elastomer and fibers; (d) impregnating the surface of the base material and elastomer obtained in the step (c) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
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